Super clean room system for semiconductor manufacturing.

Energy Saving System for Air Conditioning of Clean Room for Semiconductor Factory (Estimation of FMU System)

The total power consumption of all semiconductor plants exceeds 100 million kWh per year, with about 43% of this consumption to operate air conditioning facilities. This high power consumption is due to the requirement of the cleanliness kept for clean rooms, with extremely high power consumed to the air transferring power. Oki developed the fan module unit (FMU) type air conditioning system to...

Volatile Organic Compounds Monitoring for Semiconductor Foundry Clean Room Air

Air samples were collected in consecutive days using Summa canisters from semiconductor foundry clean rooms and air entrances. By coupling a NuTech preconcentrator with an Agilent GC-MS, an optimized method for qualitative and quantitative analysis of VOC compounds was developed. Method detection limit (MDL), blank spike (BS) and blank spike duplicate (BSD), etc. were estimated for method valid...

Laser Clean Room Re-design: a Manufacturing Facility Re-layout

2 TABLE OF FIGURES 5 INTRODUCTION 6 Problem Statement ...................................................................................................... 6 Deliverables................................................................................................................. 6 Scope ...........................................................................................................

Simulation-Based 'Smart' Operation Management System for Semiconductor Manufacturing

A Modular Simulation System for Semiconductor Manufacturing Scheduling

A modular simulation system (MSS) for the scheduling of semiconductor wafer fabrication facilities (fabs) is discussed. Firstly, the general structure model (GSM) for modeling a semiconductor wafer fab, composed of a configurable definition layer, a physical layer, a process information layer and a scheduling layer, is proposed. Secondly, a data-based dynamic modeling method is given. Thirdly, ...